Takehisa, Kiwamu: search on Z-Library

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1

Performance of a flash-lamp-pumped Nd:YAG laser with short-wavelength-cut tubes

Takehisa, Kiwamu, Yano, Makoto, Kuwabara, Kouji

Journal:

Year:

1993

Language:

english

File:

PDF, 269 KB

english, 1993

2

SPIE Proceedings [SPIE Photomask Japan 2017 - Yokohama, Japan (Wednesday 5 April 2017)] Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology - Application of EUV dark field image for EUVL mask fabrication

Takehisa, Kiwamu, Yamane, Takeshi, Watanabe, Hidehiro

Year:

2017

Language:

english

File:

PDF, 298 KB

english, 2017

3

SPIE Proceedings [SPIE Photomask Japan 2017 - Yokohama, Japan (Wednesday 5 April 2017)] Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology - Electron beam lithographic modeling assisted by artificial intelligence technology

Takehisa, Kiwamu, Nakayamada, Noriaki, Nishimura, Rieko, Miura, Satoru, Nomura, Haruyuki, Kamikubo, Takashi

Year:

2017

Language:

english

File:

PDF, 1.25 MB

english, 2017

4

SPIE Proceedings [SPIE Photomask Japan 2017 - Yokohama, Japan (Wednesday 5 April 2017)] Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology - Etch bias inversion during EUV mask ARC etch

Takehisa, Kiwamu, Lajn, Alexander, Rolff, Haiko, Wistrom, Richard

Year:

2017

Language:

english

File:

PDF, 474 KB

english, 2017

5

Special Section Guest Editorial: Photomask Manufacturing Technology

Shibuya, Masato, Hoga, Morihisa, Takehisa, Kiwamu

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2016

Language:

english

File:

PDF, 419 KB

english, 2016

6

SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - The limit to 4X EUVL

Takehisa, Kiwamu, Chen, Alek C., Lin, Burn, Yen, Anthony

Year:

2008

Language:

english

File:

PDF, 466 KB

english, 2008

7

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XIX - Yokohama, Japan (Tuesday 17 April 2012)] Photomask and Next-Generation Lithography Mask Technology XIX - EUV actinic blank inspection tool with a high magnification review mode

Suzuki, Tomohiro, Miyai, Hiroki, Takehisa, Kiwamu, Kusunose, Haruhiko, Yamane, Takeshi, Terasawa, Tsuneo, Watanabe, Hidehiro, Inoue, Soichi, Mori, Ichiro, Kato, Kokoro

Year:

2012

Language:

english

File:

PDF, 4.10 MB

english, 2012

8

Scaling up of a high average power dye laser amplifier and its new pumping designs

Takehisa, Kiwamu

Journal:

Year:

1997

Language:

english

File:

PDF, 391 KB

english, 1997

9

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Advances in the detection capability on actinic blank inspection

Panning, Eric M., Goldberg, Kenneth A., Yamane, Takeshi, Amano, Tsuyoshi, Takagi, Noriaki, Watanabe, Hidehiro, Mori, Ichro, Ino, Tomohisa, Suzuki, Tomohiro, Takehisa, Kiwamu, Miyai, Hiroki, Kusunose,

Year:

2016

Language:

english

File:

PDF, 684 KB

english, 2016

10

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - High-repetition-rate fluorine laser for microlithography

Fujimoto, Junichi, Nagai, Shinji, Shio, Koji, Iwata, Yasuaki, Takehisa, Kiwamu, Nishisaka, Toshihiro, Wakabayashi, Osamu, Mizoguchi, Hakaru, Progler, Christopher J.

Year:

2000

Language:

english

File:

PDF, 328 KB

english, 2000

11

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Mask magnification of 8X will be also helpful for EUVL

Takehisa, Kiwamu, Komuro, Masanori

Year:

2005

Language:

english

File:

PDF, 926 KB

english, 2005

12

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - Phase-shift/transmittance measurements in a micro pattern using MPM193EX

Nozawa, Hiroto, Hosono, Kunihiro, Ishida, Takayuki, Kato, Satoru, Sato, Osamu, Miyazaki, Koji, Takehisa, Kiwamu, Awamura, Naoki, Takizawa, Hideo, Kusunose, Hal

Year:

2009

Language:

english

File:

PDF, 303 KB

english, 2009

13

SPIE Proceedings [SPIE Photomask Japan 2017 - Yokohama, Japan (Wednesday 5 April 2017)] Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology - Exposure characteristics of positive tone electron beam resist containing p -chloro-α-methylstyrene

Takehisa, Kiwamu, Ochiai, Shunsuke, Takayama, Tomohiro, Kishimura, Yukiko, Asada, Hironori, Sonoda, Manae, Iwakuma, Minako, Hoshino, Ryoichi

Year:

2017

Language:

english

File:

PDF, 960 KB

english, 2017

14

SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - EUV mask substrate flatness improvement by laser irradiation

Takehisa, Kiwamu, Naber, Robert J., Kawahira, Hiroichi, Kodama, Jun, Kusunose, Haruhiko

Year:

2007

Language:

english

File:

PDF, 579 KB

english, 2007

15

SPIE Proceedings [SPIE Photomask Japan 2014 - Yokohama, Japan (Tuesday 15 April 2014)] Photomask and Next-Generation Lithography Mask Technology XXI - Performance in practical use of actinic EUVL mask blank inspection

Kato, Kokoro, Yamane, Takeshi, Kim, Yongdae, Takagi, Noriaki, Terasawa, Tsuneo, Ino, Tomohisa, Suzuki, Tomohiro, Miyai, Hiroki, Takehisa, Kiwamu, Kusunose, Haruhiko

Year:

2014

Language:

english

File:

PDF, 754 KB

english, 2014

16

SPIE Proceedings [SPIE Photomask Japan 2017 - Yokohama, Japan (Wednesday 5 April 2017)] Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology - Observation of EUVL mask using coherent EUV scatterometry microscope with high-harmonic-generation EUV source

Takehisa, Kiwamu, Mamezaki, Daiki, Harada, Tetsuo, Nagata, Yutaka, Watanabe, Takeo

Year:

2017

Language:

english

File:

PDF, 679 KB

english, 2017

17

SPIE Proceedings [SPIE Photomask Japan 2017 - Yokohama, Japan (Wednesday 5 April 2017)] Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology - GPU: the biggest key processor for AI and parallel processing

Takehisa, Kiwamu, Baji, Toru

Year:

2017

Language:

english

File:

PDF, 983 KB

english, 2017

18

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - Proposal of using EUVL for PXL

Takehisa, Kiwamu, Staud, Wolfgang, Weed, J. Tracy

Year:

2004

Language:

english

File:

PDF, 273 KB

english, 2004

19

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XX - Yokohama, Japan (Tuesday 16 April 2013)] Photomask and Next-Generation Lithography Mask Technology XX - The capability of high magnification review function for EUV actinic blank inspection tool

Miyai, Hiroki, Suzuki, Tomohiro, Takehisa, Kiwamu, Kusunose, Haruhiko, Yamane, Takeshi, Terasawa, Tsuneo, Watanabe, Hidehiro, Mori, Ichiro, Kato, Kokoro

Year:

2013

Language:

english

File:

PDF, 788 KB

english, 2013

20

SPIE Proceedings [SPIE Photomask Japan 2017 - Yokohama, Japan (Wednesday 5 April 2017)] Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology - Data preparation in the age of curvilinear patterns

Takehisa, Kiwamu, Bayle, Sébastien, Tiphine, Charles, Milléquant, Matthieu, Figueiro, Thiago, Martin, Luc, Postnikov, Sergei, Schiavone, Patrick

Year:

2017

Language:

english

File:

PDF, 341 KB

english, 2017

21

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XX - Yokohama, Japan (Tuesday 16 April 2013)] Photomask and Next-Generation Lithography Mask Technology XX - EUV scanner throughput considerations for the higher mask magnification

Takehisa, Kiwamu, Kato, Kokoro

Year:

2013

Language:

english

File:

PDF, 1.49 MB

english, 2013

22

SPIE Proceedings [SPIE Photomask Japan 2015 - Yokohama, Japan (Monday 20 April 2015)] Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII - Detection capability of Actinic Blank Inspection tool

Yoshioka, Nobuyuki, Suzuki, Tomohiro, Miyai, Hiroki, Takehisa, Kiwamu, Kusunose, Haruhiko, Watanabe, Hidehiro, Mori, Ichiro

Year:

2015

Language:

english

File:

PDF, 529 KB

english, 2015

23

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - EUV actinic blank inspection: from prototype to production

Tchikoulaeva, Anna, Naulleau, Patrick P., Miyai, Hiroki, Suzuki, Tomohiro, Takehisa, Kiwamu, Kusunose, Haruhiko, Yamane, Takeshi, Terasawa, Tsuneo, Watanabe, Hidehiro, Inoue, Soichi, Mori, Ichiro

Year:

2013

Language:

english

File:

PDF, 526 KB

english, 2013

24

SPIE Proceedings [SPIE Photomask Japan 2017 - Yokohama, Japan (Wednesday 5 April 2017)] Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology - The capability of measuring cross-sectional profile for hole patterns in nanoimprint templates using small-angle x-ray scattering

Takehisa, Kiwamu, Hagihara, Kazuki, Taniguchi, Rikiya, Yamanaka, Eiji, Omote, Kazuhiko, Ito, Yoshiyasu, Ogata, Kiyoshi, Hayashi, Naoya

Year:

2017

Language:

english

File:

PDF, 645 KB

english, 2017

25

SPIE Proceedings [SPIE Photomask Japan 2014 - Yokohama, Japan (Tuesday 15 April 2014)] Photomask and Next-Generation Lithography Mask Technology XXI - Defect analysis on actinic blank inspection tool

Kato, Kokoro, Suzuki, Tomohiro, Miyai, Hiroki, Takehisa, Kiwamu, Kusunose, Haruhiko, Yamane, Takeshi, Watanabe, Hidehiro, Mori, Ichiro

Year:

2014

Language:

english

File:

PDF, 563 KB

english, 2014

26

New designs and simulations of a 10-kW average-power longitudinally pumped dye laser amplifier

Takehisa, Kiwamu

Journal:

Year:

1994

Language:

english

File:

PDF, 853 KB

english, 1994

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